SITRI's silicon photonics platform is equipped with high-precision lithography, crystal epitaxy, dielectric film growth, dry and wet etching, doping, metal interconnection and online process detection capabilities. In response to different application scenarios, SITRI has made breakthroughs in 180 nm passive, 180 nm active and 90 nm active process technologies, and developed and established multiple sets of integration technologies and device PDKs such as 220 nm SOI, 1.5~3 μm SOI, SiN, SiN/SOI, and LiNO₃, continuously enhancing the external service capabilities of the silicon photonics platform.

In 2023, SITRI has released a SOI PDK based on the 90nm process node. The performance of its core device library has reached the international mainstream level, enabling it to provide R&D and MPW (Multi-Project Wafer) and other small-batch tape-out services for various silicon photonics chips such as optical transceivers and optical sensors.