CEA-Leti FD-SOI Technology Workshop Invitation

FD-SOI enables dramatically improved IC performance at a much lower cost and power consumption than leading-edge CMOS technologies at or below 28 nm process nodes. The success of this new technology depends on the availability of new tools, flows, platforms, methodologies and skills that are required to achieve optimal design quality and productivity.

SITRI is proudly co-organizing this Workshop with CEA-Leti, a leading global center for applied research in microelectronics, nanotechnologies and integrated systems. Topics to be addressed cover the full FD-SOI supply chain: process characteristics and roadmap, design methodologies for digital, mixed signal and RF applications, energy efficient architectures and power management techniques, IP availability and roadmaps.

You are cordially invited to this Workshop on Sept 8th afternoon in Shanghai.

Time:    Thursday, September 8th, 2016, 14:00-17:00. Registration starts at 13:45.
Venue:  Pudong, Shanghai,
Organizers:  CEA-Leti, Shanghai Industrial μTechnology Research Institute (SITRI)


Time Speech Subject
13:45 – 14:00 Registration
14:00 – 14:10 Opening
Marie Semeria, CEO, Leti (TBC)
14:10 – 14:30 Leti & Smart Miniaturized Systems (download available)
Thierry Collette, VP, DACLE/Leti
14:30 – 15:00 FDSOI Technology General Overview (download available)
Fabien Clermidy, Director Digital Design, DACLE/Leti
15:30 – 16:00 FDSOI Technology General Overview & Low-power Design (download available)
Fabien Clermidy, Director Digital Design, DACLE/Leti
16:00 – 16:30 FD-SOI RF Design Techniques (download available)
Eric Mercier, Manager RF Design, DACLE/Leti
16:30 – 17:00 CEA-Leti’s IoT Platform based on FD-SOI, a practical application example – Silicon Impulse and Conclusion
Ali Erdengiz, Sr. Manager Business Development, Leti
17:00-17:15 Wrap-up
Stan Sun, Director Design Service, SITRI